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2002 Issues
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| OPTICS FOREVER |
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| Always another step |
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| Articles |
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| "Lithography & etch process development of 50nm line patterning using SCAA mask & Si-contained bi-layer resist" - This study concludes that bi-layer resist, used with the SCAA mask and an ultra-high NA (>0.80) ArF or KrF exposure tool, can resolve certain obstacles that limit the implementation of Alt-PSM - namely, space-width alternation or other anomalies at different focus - and can extend optical lithography to sub-50nm regime for processes where pitch size is not a limiting factor.
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| "Collaboration essential for every next step in optical lithography" - As each functional portion of the lithographic imaging process becomes more critical, it becomes more dependent on all other functions surrounding it. Because of this growing interdependency, often referred to as image process integration, Canon is strengthening its collaboration with sub-100nm processing partners.
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| "RET-The search for simple freedoms" - Extensive efforts in all three areas of Resolution Enhancement Technology- exposure tools, processes and masks- have moved lithography well beyond its supposed limitations, but often at a constraining price. In this article, "Dr. Optics" sets the stage for a newly discovered freedom in exposing contact holes- one of the most difficult pattering problems for optical lithography.
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| "The Canon FPA-6000 single-stage 45nm scanning platform" - Specifications and graphics back up the introduction of Canon's new single-stage platform that "meets KrF, ArF, and F2 production specs...today!" The article details the two Canon scanner models, the FPA-6000ES5 and the FPA-6000AS4, built on this compact new platform.
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| "Defocus as an Aberration" - In a continuing tutorial, two previously discussed topics - focus control and impact of focus on the resist profile - are advanced to explain that defocus can be thought of as causing a wavefront error in the same way an aberration does.
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| "Taking the next step in illumination. The Cymer MOPA laser." - In interview format, Robert P. Akins, President and Chief Executive Officer, Cymer, Inc., gives the rationale for his company's new family of light source products using a dual-chamber design called MOPA (Master Oscillator Power Amplifier).
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Summer 2002 |
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Volume 7, Issue 2 |
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| If you would like copies of SubMicron Focus please Click Here to go to the Contact Page and fill in the Registration Form. |
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| TAKING ON THE CHALENGES |
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| More than ever it takes working together |
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| Articles |
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| "300mm wafer CD uniformity for 0.18um and 0.15um photoresist" - This study using a Canon FPA-5000ES2 Scanner (NA 0.68) and an FSI International Polaris 3500 Microlithography Cluster, was conducted to determine the capabilities of this 300mm tool set to achieve uniform critical dimensions for 0.18mm and 0.15mm photoresist features. Results are reported for within-wafer and wafer-to-wafer uniformity.
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| "What does it take to be a Leader? A deeper focus on excellence." - When outlining Phase 2 of Canon's overall Excellent Global Corporation Plan, Fujio Mitarai, President and CEO of Canon, Inc., stated that the company should own the market in its main product lines including semiconductor production equipment. This article defines the necessary marketing emphasis and overarching commitment to excellence.
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| "Spherical abberation" - New photoresists, and resolution enhancement technologies that use the peripheral portion of the pupil, make removal of the spherical aberration of greater importance than ever before. This "Dr. Optics" article explores the phenomenon affecting the performance of all imaging points.
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| "A well-tested 200mm/ 300mm bridge to 100nm patterning: Introducing the newest Canon toolset." - A detailed presentation of Canon's line-up of thoroughly-proven 5000-Series tools, from ArF through i-line, including the 300mm-ready FPA-5500iX wide-field i-line stepper.
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| "The cause of asymmetry" - In this regular tutorial feature, a theory is presented stating that the cause of observed asymmetry between plus and minus focus invoves the way the arerial image interacts with the photoresist to produce the final CD.
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| "Immersion lithography at 157nm" - In this Q&A-style article, researchers at MIT's Lincoln Laboratory explain the principles and give their preliminary findings on a method of resolution enhancement that has the potential to extend optical lithography two technology nodes for each wavelength.
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Spring 2002 |
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Volume 7, Issue 1 |
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| If you would like copies of SubMicron Focus please Click Here to go to the Contact Page and fill in the Registration Form. |
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