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| SUBMICRON FOCUS NEWSLETTER |
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Thank you for your interest in SubMicron Focus, Canon's newsletter informing our customers and partners of the latest lithography developments. In addition to technical articles contributed by industry, SubMicron Focus also features news about Canon, developments in microlithography, and product and event information.
Your feedback is welcome. Let us know if you have suggestions for future issues or would like to contribute a relevant article. Contact us at semimarketing@cusa.canon.com.
If you would like copies of SubMicron Focus, please email us your request.
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| CURRENT ISSUE |
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| Aligning the ROI Roadmap |
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| Simpler,Smarter Imaging Options
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| Articles |
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| "Canon 157nm update: Bring on the scanners" - At the coming 4th International Symposium on 157nm Lithography, all eyes will be on the first 157nm scanners. This article is the Canon "Report Card" on its program to complete a full-field first-generation F2 scanner system by the fourth quarter of 2003; followed by a full production tool, the FPA-6000FS2, in early 2005.
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| "NGL: Outlook and insights" - Mainly about Canon's EUV lithography (EUVL) program - reviews its applicable pioneering work with soft X-ray, its progress in building the infrastructure for building EUVL tools (including a new reflectometer), and its at-wavelength metrology.work with EUVA, a Japanese research consortium. But the article also reports on Canon's other NGL initiative, the Maskless ML2 lithography program.
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| "Which aberration is Z1,000,000(r,)?" - Dr. Optics draws up a new appreciation of Zernike Polynomials, including a discussion of how to analyze wavefront maps.
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| "A Mission Statement That Maps Reality" - The U.S. Semiconductor Equipment Divison's new mission statement is the "marching orders" for its strong role in Canon's move to lithography leadership. Namely, to become the foremost partner of lithography customers who operate in or from within the U.S. market.
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| "Lithography and the Back End of the Line" - Chris A. Mack gives the matter of wiring together the transistors after gate patterning, known as BEOL processing, the attention it deserves as a critical contributor to circuit performance. SPECIAL NOTE: Chris Mack has contributed to all 20 issues of SubMicron Focus.
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| "Canon at SPIE Microlithography 2002" - In addition to announcing a new exhibition booth and special events and sponsorships, this section provides a synopsis of all Canon papers presented.
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| "Extending ArF to the 65-nm node" - In this guest article, Frank Driessen, Numerical Technologies, Inc., presents a shifting technique called Full Phase that indicates the industry can reliably extend 193-nm lithography to the 65-nm process node using today's lenses.
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| "Mechatronics: Finessing the roadmap." - (The story behind the Canon FPA-6000 platform design.) Dr. Shigeyuki Uzawa, who led the the FPA-6000 platform development project, describes how the close integration of intelligent ultra-precision dynamic systems and subsystems across enables Canon's latest platform to achieve performance to the 45nm node.
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Winter/Spring 2002-2003 Volumn8, Issue 1 |
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